Alessia Motta, Gabriele Seguini, Claudia Wiemer, Michele Perego

Sequential Infiltration Synthesis of Al2O3 in PMMA Thin Films: Temperature Investigation by Operando Spectroscopic Ellipsometry

ACS Applied Materials & Interfaces [American Chemical Society], Volume: 16 Issue: 27 Pages: 35825-35833

Michele Perego, Gabriele Seguini, Claudia Wiemer, Federica E Caligiore, Elena Cianci

Al 2 O 3 growth in PMMA thin films by sequential infiltration synthesis: in situ thickness evolution and mass uptake investigation

Materials Advances [Royal Society of Chemistry], Volume: 5 Issue: 9 Pages: 3992-3997

Clément Chassain, Andrzej Kusiak, Cécile Gaborieau, Yannick Anguy, Nguyet-Phuong Tran, Chiara Sabbione, Marie-Claire Cyrille, Claudia Wiemer, Alessio Lamperti, Jean-Luc Battaglia

Thermal characterization of Ge-rich GST/TiN thin multilayers for phase change memories

Journal of Applied Physics [AIP Publishing], Volume: 133 Issue: 22

Viviana Maria Ospina, Riccardo Chiarcos, Diego Antonioli, Valentina Gianotti, Michele Laus, Stefano Kuschlan, Claudia Wiemer, Michele Perego

Brush Layers of Bioinspired Polypeptoids for Deterministic Doping of Semiconductors

ACS Applied Electronic Materials [American Chemical Society], Volume: 4 Issue: 12 Pages: 6029-6037

Alessia Motta, Gabriele Seguini, Michele Perego, Roberto Consonni, Antonella Caterina Boccia, Gina Ambrosio, Camilla Baratto, Pierfrancesco Cerruti, Marino Lavorgna, Stefano Tagliabue, Claudia Wiemer

Sequential Infiltration Synthesis of Al2O3 in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

ACS Applied Polymer Materials [American Chemical Society], Volume: 4 Issue: 10 Pages: 7191-7203

Sandeep Kumar Verma, Kavindra Kandpal, Pramod Kumar, Arun Kumar, Claudia Wiemer

Performance of Topological Insulator (Sb2Te3)-Based Vertical Stacking Photodetector on n-Si Substrate

IEEE Transactions on Electron Devices [IEEE], Volume: 69 Issue: 8 Pages: 4342 - 4348

Tao Wang, Stefano Brivio, Elena Cianci, Claudia Wiemer, Michele Perego, Sabina Spiga, Mario Lanza

Improving HfO2-Based Resistive Switching Devices by Inserting a TaOx Thin Film via Engineered In Situ Oxidation

ACS Applied Materials & Interfaces [American Chemical Society],

Arun Kumar, Seyed Ariana Mirshokraee, Alessio Lamperti, Matteo Cantoni, Massimo Longo, Claudia Wiemer

Interface Analysis of MOCVD Grown GeTe/Sb2Te3 and Ge-Rich Ge-Sb-Te/Sb2Te3 Core-Shell Nanowires

Nanomaterials [MDPI], Volume: 12 Issue: 10 Pages: 1623

A Kumar, SA Mirshokraee, A Lamperti, M Cantoni, M Longo, C Wiemer

Interface Analysis of MOCVD Grown GeTe/Sb2Te3 and Ge-Rich Ge-Sb-Te/Sb2Te3 Core-Shell Nanowires. Nanomaterials 2022, 12, 1623

Synthesis, Properties and Applications of Germanium Chalcogenides [s Note: MDPI stays neutral with regard to jurisdictional claims in published maps and institutional affil-iations.], Pages: 135

Arun Kumar, Raimondo Cecchini, Claudia Wiemer, Valentina Mussi, Sara De Simone, Raffaella Calarco, Mario Scuderi, Giuseppe Nicotra, Massimo Longo

Phase Change Ge-Rich Ge–Sb–Te/Sb2Te3 Core-Shell Nanowires by Metal Organic Chemical Vapor Deposition

Nanomaterials [Multidisciplinary Digital Publishing Institute], Volume: 11 Issue: 12 Pages: 3358

Arun Kumar, Vikash Kumar, Alessandro Romeo, Claudia Wiemer, Gino Mariotto

Raman Spectroscopy and In Situ XRD Probing of the Thermal Decomposition of Sb2Se3 Thin Films

The Journal of Physical Chemistry C [American Chemical Society],

Martino Rimoldi, Raimondo Cecchini, Claudia Wiemer, Emanuele Longo, Stefano Cecchi, Roberto Mantovan, Massimo Longo

Effect of Substrates and Thermal Treatments on Metalorganic Chemical Vapor Deposition-Grown Sb2Te3 Thin Films

Crystal Growth & Design [American Chemical Society], Volume: 21 Issue: 9 Pages: 5135-5144

Arun Kumar, Raimondo Cecchini, Lorenzo Locatelli, Claudia Wiemer, Christian Martella, Lucia Nasi, Laura Lazzarini, Roberto Mantovan, Massimo Longo

Large-Area MOVPE Growth of Topological Insulator Bi2Te3 Epitaxial Layers on i-Si(111)

Crystal Growth & Design [American Chemical Society], Volume: 21 Issue: 7 Pages: 4023-4029

Arun Kumar, Raimondo Cecchini, Claudia Wiemer, Valentina Mussi, Sara De Simone, Raffaella Calarco, Mario Scuderi, Giuseppe Nicotra, Massimo Longo

MOCVD Growth of GeTe/Sb2Te3 Core–Shell Nanowires

Coatings [Multidisciplinary Digital Publishing Institute], Volume: 11 Issue: 6 Pages: 718

Raimondo Cecchini, Christian Martella, Claudia Wiemer, Alessio Lamperti, Alberto Debernardi, Lucia Nasi, Laura Lazzarini, Alessandro Molle, Massimo Longo

Vapor phase epitaxy of antimonene-like nanocrystals on germanium by an MOCVD process

Applied Surface Science [North-Holland], Volume: 535 Pages: 147729

R. Mantovan E. Longo, M. Belli, M. Alia, M. Rimoldi, R. Cecchini, M. Longo, C. Wiemer, L. Locatelli, P. Tsipas, A. Dimoulas, G. Gubbiotti, M. Fanciulli

Large spin-to-charge conversion at room temperature in extended epitaxial Sb2Te3 topological insulator chemically grown on Silicon

Advanced Functional Materials [Wiley-VCH], Pages: 2109361

Emanuele Longo, Claudia Wiemer, Raimondo Cecchini, Massimo Longo, Alessio Lamperti, Anton Khanas, Andrei Zenkevich, Matteo Cantoni, Christian Rinaldi, Marco Fanciulli, Roberto Mantovan

Fe/Sb2Te3 Interface Reconstruction through Mild Thermal Annealing

Advanced Materials Interfaces [], Volume: 7 Issue: 19 Pages: 2000905

Raimondo Cecchini, Christian Martella, Claudia Wiemer, Alessio Lamperti, Alberto Debernardi, Lucia Nasi, Laura Lazzarini, Alessandro Molle, Massimo Longo

Vapor phase epitaxy of antimonene-like nanocrystals on germanium by an MOCVD process

Applied Surface Science [North-Holland], Volume: 535 Pages: 147729

Emanuele Longo, Claudia Wiemer, Matteo Belli, Raimondo Cecchini, Massimo Longo, Matteo Cantoni, Christian Rinaldi, Michael D Overbeek, Charles H Winter, Gianluca Gubbiotti, Graziella Tallarida, Marco Fanciulli, Roberto Mantovan

Ferromagnetic resonance of Co thin films grown by atomic layer deposition on the Sb2Te3 topological insulator

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 509 Pages: 166885

Emanuele Longo, Roberto Mantovan, Raimondo Cecchini, Michael D Overbeek, Massimo Longo, Giovanna Trevisi, Laura Lazzarini, Graziella Tallarida, Marco Fanciulli, Charles H Winter, Claudia Wiemer

ALD growth of ultra-thin Co layers on the topological insulator Sb 2 Te 3

Nano Research [Tsinghua University Press], Volume: 13 Issue: 2 Pages: 570-575

Martino Rimoldi, Raimondo Cecchini, Claudia Wiemer, Alessio Lamperti, Emanuele Longo, Lucia Nasi, Laura Lazzarini, Roberto Mantovan, Massimo Longo

Epitaxial and large area Sb 2 Te 3 thin films on silicon by MOCVD

RSC Advances [Royal Society of Chemistry], Volume: 10 Issue: 34 Pages: 19936-19942

Raimondo Cecchini, Raja SR Gajjela, Christian Martella, Claudia Wiemer, Alessio Lamperti, Lucia Nasi, Laura Lazzarini, Luca G Nobili, Massimo Longo

High‐Density Sb2Te3 Nanopillars Arrays by Templated, Bottom‐Up MOCVD Growth

Small [], Volume: 15 Issue: 37 Pages: 1901743

E Longo, C Wiemer, R Cecchini, M Longo, A Lamperti, A Khanas, A Zenkevich, M Fanciulli, R Mantovan

Chemical, structural and magnetic properties of the Fe/Sb2Te3 interface

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 474 Pages: 632-636

R Cecchini, S Selmo, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

In-doped Sb nanowires grown by MOCVD for high speed phase change memories.

Micro and Nano Engineering [Elsevier], Volume: 2 Pages: 117-121

R Cecchini, S Selmo, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

In-doped Sb nanowires grown by MOCVD for high speed phase change memories

Micro and Nano Engineering [Elsevier], Volume: 2 Pages: 117-121

E Longo, C Wiemer, R Cecchini, M Longo, A Lamperti, A Khanas, A Zenkevich, M Fanciulli, R Mantovan

Chemical, structural and magnetic properties of the Fe/Sb2Te3 interface

Journal of Magnetism and Magnetic Materials [North-Holland],

E Cianci, A Lamperti, G Tallarida, M Zanuccoli, C Fiegna, L Lamagna, S Losa, S Rossini, F Vercesi, D Gatti, C Wiemer

Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications

Sensors and Actuators A: Physical [Elsevier], Volume: 282 Pages: 124-131

Sabina Spiga, Francesco Driussi, Gabriele Congedo, Claudia Wiemer, Alessio Lamperti, Elena Cianci

Sub-1-nm equivalent oxide thickness Al-HfO2 trapping layer with excellent thermal stability and retention for non-volatile memory

ACS Applied Nano Materials [American Chemical Society], Volume: 1 Issue: 9 Pages: 4633-4641

Raimondo Cecchini, Simone Selmo, Claudia Wiemer, Enzo Rotunno, Laura Lazzarini, Marta De Luca, Ilaria Zardo, Massimo Longo

Single-step Au-catalysed synthesis and microstructural characterization of core–shell Ge/In–Te nanowires by MOCVD

Materials Research Letters [Taylor & Francis], Volume: 6 Issue: 1 Pages: 29-35

Raimondo Cecchini, Roberto Mantovan, Claudia Wiemer, Lucia Nasi, Laura Lazzarini, Massimo Longo

Weak Antilocalization in Granular Sb2Te3 Thin Films Deposited by MOCVD

physica status solidi (RRL)–Rapid Research Letters [WILEY? VCH Verlag Berlin GmbH], Pages: 1800155

Raimondo Cecchini, Roberto Mantovan, Claudia Wiemer, Lucia Nasi, Laura Lazzarini, Massimo Longo

Weak Antilocalization in Granular Sb2Te3 Thin Films Deposited by MOCVD

physica status solidi (RRL)–Rapid Research Letters [WILEY? VCH Verlag Berlin GmbH], Pages: 1800155

R Mantovan, R Fallica, A Mokhles Gerami, TE Mølholt, C Wiemer, M Longo, HP Gunnlaugsson, K Johnston, H Masenda, D Naidoo, M Ncube, K Bharuth-Ram, M Fanciulli, Hafliði Pétur Gíslason, Guido Langouche, Sveinn Olafsson, G Weyer

Atomic-scale study of the amorphous-to-crystalline phase transition mechanism in GeTe thin films.

Scientific reports [Nature Publishing Group], Volume: 7 Issue: 1 Pages: 1-12

Raimondo Cecchini, Simone Selmo, Claudia Wiemer, Enzo Rotunno, Laura Lazzarini, Marta De Luca, Ilaria Zardo, Massimo Longo

Single-step Au-catalysed synthesis and microstructural characterization of core–shell Ge/In–Te nanowires by MOCVD

Materials Research Letters [Taylor & Francis], Volume: 6 Issue: 1 Pages: 29-35

MA Rabie, I Aden-Ali, YM Haddara, M Zanuccoli, C Fiegna, E Cianci, C Wiemer, A Lamperti, G Tallarida, L Lamagna, S Losa, S Rossini, F Vercesi, I Semenikhin, H Hirai, M Ogawa, S Souma, T Akiyama, K Sasaoka, M Kampl, H Kosina, SH Ahn, MW Ryu, E Jang, HJ Jeon, KR Kim, Z Kargar, D Ruic, T Linn, C Jungemann, HY Wong, N Braga, RV Mickevicius, S Jung, J Seo, S Heo, M Shin, SC Lu, Y Kim, MJ Gilbert, U Ravaioli, MY Mohamed

Том. 2017-September. 2017 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2017.-Сер. 2017 International Conference on Simulation of …

Simulation [], Volume: 69 Pages: 72

S Selmo, R Cecchini, S Cecchi, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

Low power phase change memory switching of ultra-thin In3Sb1Te2 nanowires

Applied Physics Letters [AIP Publishing LLC], Volume: 109 Issue: 21 Pages: 213103

Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [American Vacuum Society], Volume: 34 Issue: 5 Pages: 051510

J‐L Battaglia, A Kusiak, C Gaborieau, Y Anguy, HT Nguyen, C Wiemer, R Fallica, D Campi, M Bernasconi, M Longo

Evolution of thermal conductivity of In3Sbβ Teγ thin films up to 550° C

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag Berlin GmbH], Volume: 10 Issue: 7 Pages: 544-548

Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Applied Surface Science [North-Holland], Volume: 368 Pages: 470-476

S Vangelista, A Lamperti, C Wiemer, M Fanciulli, R Mantovan

Atomic Layer Deposition of hexagonal ErFeO 3 thin films on SiO 2/Si

Thin Solid Films [Elsevier], Volume: 604 Pages: 18-22

S Selmo, S Cecchi, R Cecchini, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Longo

MOCVD growth and structural characterization of In–Sb–Te nanowires

physica status solidi (a) [], Volume: 213 Issue: 2 Pages: 335-338

Enzo Rotunno, Massimo Longo, Claudia Wiemer, Roberto Fallica, Davide Campi, Marco Bernasconi, Andrew R Lupini, Stephen J Pennycook, Laura Lazzarini

A Novel Sb2Te3 Polymorph Stable at the Nanoscale

Chemistry of Materials [American Chemical Society], Volume: 27 Issue: 12 Pages: 4368-4373

G Seguini, J Llamoja Curi, S Spiga, G Tallarida, C Wiemer, M Perego

Solid-state dewetting of ultra-thin Au films on SiO {sub 2} and HfO {sub 2}

Nanotechnology [], Volume: 25

G Seguini, J Llamoja Curi, S Spiga, G Tallarida, C Wiemer, M Perego

Solid-state dewetting of ultra-thin Au films on SiO2 and HfO2

Nanotechnology [IOP Publishing], Volume: 25 Issue: 49 Pages: 495603

Jean-Luc Battaglia, Andrzej Kusiak, Abdelhak Saci, Roberto Fallica, Alessio Lamperti, Claudia Wiemer

Effect of a thin Ti interfacial layer on the thermal resistance of Ge2Sb2Te5-TiN stack

Applied Physics Letters [AIP Publishing LLC], Volume: 105 Issue: 12 Pages: 121903

Alessio Lamperti, Alessandro Molle, Elena Cianci, Claudia Wiemer, S Spiga, M Fanciulli

Effect on Al: MO 2/In 0.53 Ga 0.47 As interface (M= Hf, Zr) of trimethyl-aluminum pre-treatment during atomic layer deposition

Thin Solid Films [Elsevier], Volume: 563 Pages: 44-49

A Lamperti, A Molle, E Cianci, C Wiemer, S Spiga, M Fanciulli

Effect on Al: MO2/In0. 53Ga0. 47As interface (M= Hf, Zr) of trimethyl-aluminum pre-treatment during atomic layer deposition

Thin solid films [Elsevier], Volume: 563 Pages: 44-49

A Lamperti, A Molle, E Cianci, C Wiemer, S Spiga, M Fanciulli

Effect on Al: MO {sub 2}/In {sub 0.53} Ga {sub 0.47} As interface (M= Hf, Zr) of trimethyl-aluminum pre-treatment during atomic layer deposition

Thin Solid Films [], Volume: 563

Roberto Fallica, Claudia Wiemer, Toni Stoycheva, Elena Cianci, Massimo Longo, Huu Tan Nguyen, Andrzej Kusiak, Jean-Luc Battaglia

Thermal properties of In–Sb–Te films and interfaces for phase change memory devices

Microelectronic engineering [Elsevier], Volume: 120 Pages: 3-8

R Mantovan, S Vangelista, C Wiemer, A Lamperti, G Tallarida, E Chikoidze, Y Dumont, M Fanciulli

Synthesis of multiferroic Er-Fe-O thin films by atomic layer and chemical vapor deposition

Journal of Applied Physics [American Institute of Physics], Volume: 115 Issue: 17 Pages: 17D907

Elena Cianci, Alessandro Molle, Alessio Lamperti, Claudia Wiemer, Sabina Spiga, Marco Fanciulli

Phase Stabilization of Al: HfO2 Grown on In x Ga1–x As Substrates (x= 0, 0.15, 0.53) via Trimethylaluminum-Based Atomic Layer Deposition

ACS applied materials & interfaces [American Chemical Society], Volume: 6 Issue: 5 Pages: 3455-3461

Roberto Fallica, Enrico Varesi, Luca Fumagalli, Simona Spadoni, Massimo Longo, Claudia Wiemer

Effect of nitrogen doping on the thermal conductivity of GeTe thin films

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag], Volume: 7 Issue: 12 Pages: 1107-1111

Andrea Cappella, Jean‐Luc Battaglia, Vincent Schick, Andrzej Kusiak, Alessio Lamperti, Claudia Wiemer, Bruno Hay

High temperature thermal conductivity of amorphous Al2O3 thin films grown by low temperature ALD

Advanced Engineering Materials [], Volume: 15 Issue: 11 Pages: 1046-1050

Roberto Fallica, Toni Stoycheva, Claudia Wiemer, Massimo Longo

Structural and electrical analysis of In–Sb–Te‐based PCM cells

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag], Volume: 7 Issue: 11 Pages: 1009-1013

Andrea Cappella, Jean‐Luc Battaglia, Vincent Schick, Andrzej Kusiak, Alessio Lamperti, Claudia Wiemer, Bruno Hay

High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD

Advanced Engineering Materials [], Volume: 15 Issue: 11 Pages: 1046-1050

A Molle, E Cianci, A Lamperti, C Wiemer, S Spiga, M Fanciulli

A Viable Route to Enhance Permittivity of Gate Dielectrics on In0. 53Ga0. 47As (001): Trimethylaluminum-Based Atomic Layer Deposition of MeO2 (Me= Zr, Hf)

ECS Journal of Solid State Science and Technology [IOP Publishing], Volume: 2 Issue: 9 Pages: P395

Jean-Luc Battaglia, Vincent Schick, Clément Rossignol, Andrzej Kusiak, Isabelle Aubert, Alessio Lamperti, Claudia Wiemer

Thermal resistance at Al-Ge2Sb2Te5 interface

Applied Physics Letters [American Institute of Physics], Volume: 102 Issue: 18 Pages: 181907

M Longo, T Stoycheva, R Fallica, C Wiemer, L Lazzarini, E Rotunno

Au-catalyzed synthesis and characterisation of phase change Ge-doped Sb–Te nanowires by MOCVD

Journal of crystal growth [North-Holland], Volume: 370 Pages: 323-327

Gabriele Congedo, Claudia Wiemer, Alessio Lamperti, Elena Cianci, Alessandro Molle, Flavio G Volpe, Sabina Spiga

Atomic layer-deposited Al–HfO 2/SiO 2 bi-layers towards 3D charge trapping non-volatile memory

Thin Solid Films [Elsevier], Volume: 533 Pages: 9-14

T Stoycheva, M Longo, R Fallica, F Volpe, C Wiemer

Growth study and characterization of In–Sb–Te compounds deposited onto different substrates by metal–organic chemical vapour deposition

Thin solid films [Elsevier], Volume: 533 Pages: 66-69

G Seguini, E Cianci, C Wiemer, D Saynova, JAM Van Roosmalen, M Perego

Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

Applied Physics Letters [American Institute of Physics], Volume: 102 Issue: 13 Pages: 131603

Alessandro Molle, Elena Cianci, Alessio Lamperti, Claudia Wiemer, Silvia Baldovino, Luca Lamagna, Sabina Spiga, Marco Fanciulli, Guy Brammertz, Clement Merckling, Matty Caymax

Trimethylaluminum-based Atomic Layer Deposition of MO2 (M= Zr, Hf): Gate Dielectrics on In0. 53Ga0. 47As (001) Substrates

ECS Transactions [IOP Publishing], Volume: 50 Issue: 13 Pages: 11

Jean-Luc Battaglia, Vincent Schick, Andrzej Kusiak, Clément Rossignol, Claudia Wiemer, Alessio Lamperti

Identification of the temperature-dependent thermal boundary resistance at a metal-phase change material

Inverse Problems in Science and Engineering [Taylor & Francis Group], Volume: 20 Issue: 7 Pages: 941-950

Roberto Fallica, Flavio Volpe, Massimo Longo, Claudia Wiemer, Olivier Salicio, Adulfas Abrutis

Electronic properties of crystalline Ge1-xSbxTey thin films

Applied Physics Letters [American Institute of Physics], Volume: 101 Issue: 10 Pages: 102105

E Ravizza, S Spadoni, R Piagge, P Comite, C Wiemer

XPS composition study of stacked Si oxide/Si nitride/Si oxide nano‐layers

Surface and interface analysis [John Wiley & Sons, Ltd], Volume: 44 Issue: 8 Pages: 1209-1213

E Ravizza, S Spadoni, R Piagge, P Comite, C Wiemer

XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers.

Surface & Interface Analysis: SIA [], Volume: 44 Issue: 8

S Spiga, R Rao, L Lamagna, C Wiemer, G Congedo, A Lamperti, A Molle, M Fanciulli, F Palma, F Irrera

Structural and electrical properties of atomic layer deposited Al-doped ZrO2 films and of the interface with TaN electrode

Journal of Applied Physics [American Institute of Physics], Volume: 112 Issue: 1 Pages: 014107

C Wiemer, L Lamagna, M Fanciulli

Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications

Semiconductor Science and Technology [IOP Publishing], Volume: 27 Issue: 7 Pages: 074013

Alessandro Molle, Elena Cianci, Alessio Lamperti, Claudia Wiemer, Silvia Baldovino, Luca Lamagna, Sabina Spiga, Marco Fanciulli, Guy Brammertz, Clement Merckling, Matty Caymax

Trimethylaluminum-Based Atomic Layer Deposition of Al: MO2 (M= Zr, Hf): A Viable Route to Integrate High-Permittivity Oxides on In0. 53Ga0. 47As Substrates

ECS Meeting Abstracts [IOP Publishing], Issue: 28 Pages: 2457

Luca Lamagna, Claudia Wiemer, Michele Perego, Sabina Spiga, Jesus Rodriguez, David Santiago Coll, Maria Elena Grillo, Sylwia Klejna, Simon D Elliott

Mechanisms for substrate-enhanced growth during the early stages of atomic layer deposition of alumina onto silicon nitride surfaces

Chemistry of Materials [American Chemical Society], Volume: 24 Issue: 6 Pages: 1080-1090

Massimo Longo, Roberto Fallica, Claudia Wiemer, Olivier Salicio, Marco Fanciulli, Enzo Rotunno, Laura Lazzarini

Metal organic chemical vapor deposition of phase change Ge1Sb2Te4 nanowires

Nano letters [American Chemical Society], Volume: 12 Issue: 3 Pages: 1509-1515

L Lamagna, A Molle, C Wiemer, S Spiga, C Grazianetti, G Congedo, M Fanciulli

Atomic Layer Deposition of Al-Doped ZrO2 Thin Films as Gate Dielectric for In0. 53Ga0. 47As

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 159 Issue: 3 Pages: H220-H224

L Lamagna, A Molle, C Wiemer, S Spiga, C Grazianetti, G Congedo, M Fanciulli

Atomic layer deposition of Al-doped ZrO2 thin films as gate dielectric for In0. 53Ga0. 47As

Journal of The Electrochemical Society [IOP Publishing], Volume: 159 Issue: 3 Pages: H220

C Wiemer, A Debernardi, A Lamperti, A Molle, O Salicio, L Lamagna, M Fanciulli

Influence of lattice parameters on the dielectric constant of tetragonal ZrO2 and La-doped ZrO2 crystals in thin films deposited by atomic layer deposition on Ge (001)

Applied Physics Letters [American Institute of Physics], Volume: 99 Issue: 23 Pages: 232907

Alessandro Molle, Luca Lamagna, Claudia Wiemer, Sabina Spiga, Marco Fanciulli, Clement Merckling, Guy Brammertz, Matty Caymax

Improved Performance of In 0.53 Ga 0.47 As-Based Metal-Oxide-Semiconductor Capacitors with Al: ZrO 2 Gate Dielectric Grown by Atomic …

Applied Physics Express [IOP Publishing], Volume: 4 Issue: 9

Alessandro Molle, Luca Lamagna, Claudia Wiemer, Sabina Spiga, Marco Fanciulli, Clement Merckling, Guy Brammertz, Matty Caymax

Improved Performance of In0. 53Ga0. 47As-Based Metal–Oxide–Semiconductor Capacitors with Al: ZrO2 Gate Dielectric Grown by Atomic Layer Deposition

Applied physics express [IOP Publishing], Volume: 4 Issue: 9 Pages: 094103

C Wiemer, A Lamperti, L Lamagna, O Salicio, A Molle, M Fanciulli

Detection of the tetragonal phase in atomic layer deposited La-doped ZrO2 thin films on germanium

Journal of The Electrochemical Society [IOP Publishing], Volume: 158 Issue: 8 Pages: G194

W Gawelda, Jan Siegel, Carmen N Afonso, V Plausinaitiene, A Abrutis, C Wiemer

Dynamics of laser-induced phase switching in GeTe films

Journal of Applied Physics [American Institute of Physics], Volume: 109 Issue: 12 Pages: 123102

Claudia Wiemer, Alessio Lamperti, Luca Lamagna, Olivier Salicio, Alessandro Molle, Marco Fanciulli

Detection of the Tetragonal and Monoclinic Phases and their Role on the Dielectric Constant of Atomic Layer Deposited La-Doped ZrO2 Thin Films on Ge (001)

ECS Transactions [IOP Publishing], Volume: 35 Issue: 3 Pages: 481

Luca Lamagna, Alessandro Molle, Claudia Wiemer, Sabina Spiga, Carlo Grazianetti, Marco Fanciulli

Atomic Layer Deposition of Al-Doped ZrO2 Thin Films for Advanced Gate Stack on III-V Substrates

ECS Transactions [IOP Publishing], Volume: 35 Issue: 3 Pages: 431

C Wiemer, S Baldovino, L Lamagna, M Perego, Sylvie Schamm-Chardon, M Fanciulli

Structural and electrical properties of Er-doped HfO 2 and of its interface with Ge (001)

Microelectronic engineering [Elsevier], Volume: 88 Issue: 4 Pages: 415-418

Sylvie Schamm-Chardon, Pierre-Eugène Coulon, L Lamagna, C Wiemer, S Baldovino, M Fanciulli

Combining HRTEM–EELS nano-analysis with capacitance–voltage measurements to evaluate high-κ thin films deposited on Si and Ge as candidate for future gate dielectrics

Microelectronic engineering [Elsevier], Volume: 88 Issue: 4 Pages: 419-422

M Longo, C Wiemer, O Salicio, M Fanciulli, L Lazzarini, E Rotunno

Au-catalyzed self assembly of GeTe nanowires by MOCVD

Journal of crystal growth [North-Holland], Volume: 315 Issue: 1 Pages: 152-156

Vincent Schick, JL Battaglia, A Kusiak, C Rossignol, C Wiemer

Temperature dependant thermal and mechanical properties of a metal-phase change layer interface using the time resolved pump probe technique

Journal of Physics: Conference Series [IOP Publishing], Volume: 278 Issue: 1 Pages: 012024

Marco Fanciulli, Clement Merckling, Guy Brammertz, Matty Caymax

Improved Performance of In0. 53Ga0. 47As-Based Metal–Oxide–Semiconductor Capacitors with Al: ZrO2 Gate Dielectric Grown by Atomic Layer Deposition

Applied Physics Express [], Volume: 4 Pages: 094103

L Lamagna, C Wiemer, M Perego, SN Volkos, S Baldovino, D Tsoutsou, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, M Fanciulli

O 3-based atomic layer deposition of hexagonal La 2 O 3 films on Si (100) and Ge (100) substrates

Journal of Applied Physics [American Institute of Physics], Volume: 108 Issue: 8 Pages: 084108

Annalisa Del Vitto, Rossella Piagge, Enrica Ravizza, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Claudia Wiemer, Gabriella Ghidini, Mauro Alessandri, Marco Fanciulli, Jan Willem Maes, Mohith Verghese

Evaluation of HfLaOx as Blocking Layer for Innovative Nonvolatile Memory Applications

ECS Transactions [IOP Publishing], Volume: 33 Issue: 3 Pages: 417

Annalisa Del Vitto, Rossella Piagge, Enrica Ravizza, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Claudia Wiemer, Gabriella Ghidini, Mauro Alessandri, Marco Fanciulli, Jan Willem Maes, Mohith Verghese

LaHfOx Films Analyses for NVM Applications

ECS Meeting Abstracts [IOP Publishing], Issue: 22 Pages: 1523

Annalisa Del Vitto, Rossella Piagge, Enrica Ravizza, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Claudia Wiemer, Gabriella Ghidini, Mauro Alessandri, Marco Fanciulli, Jan Willem Maes, Mohith Verghese

LaHfOx Films Analyses for NVM Applications

Meeting Abstracts [The Electrochemical Society], Issue: 22 Pages: 1523-1523

Jan Siegel, D Puerto, J Solis, Francisco Javier García de Abajo, Carmen N Afonso, M Longo, Claudia Wiemer, M Fanciulli, Paul Kühler, Mario Mosbacher, Paul Leiderer

Ultraviolet optical near-fields of microspheres imprinted in phase change films

Applied physics letters [American Institute of Physics], Volume: 96 Issue: 19 Pages: 193108

C Wiemer, L Lamagna, S Baldovino, M Perego, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, O Salicio, G Congedo, S Spiga, M Fanciulli

Dielectric properties of Er− doped HfO 2 (Er∼ 15%) grown by atomic layer deposition for high-κ gate stacks

Applied Physics Letters [American Institute of Physics], Volume: 96 Issue: 18 Pages: 182901

Jean-Luc Battaglia, Andrea Cappella, Enrico Varesi, Vincent Schick, Andrzej Kusiak, Claudia Wiemer, Andrea Gotti, Bruno Hay

Temperature-dependent thermal characterization of Ge2Sb2Te5 and related interfaces by the photothermal radiometry technique

Journal of Physics: Conference Series [IOP Publishing], Volume: 214 Issue: 1 Pages: 012102

M Alessandri, A Del Vitto, R Piagge, A Sebastiani, C Scozzari, C Wiemer, L Lamagna, M Perego, G Ghidini, M Fanciulli

Rare earth-based high-k materials for non-volatile memory applications

Microelectronic engineering [Elsevier], Volume: 87 Issue: 3 Pages: 290-293

Jean-Luc Battaglia, Andrea Cappella, Vincent Schick, Andrzej Kusiak, Enrico Varesi, Andrea Gotti, Claudia Wiemer, Massimo Longo, Bruno Hay

Temperature-dependent thermal characterization of Ge {sub 2} Sb {sub 2} Te {sub 5} and related interfaces by the photothermal radiometry technique

Journal of Physics. Conference Series (Online) [], Volume: 214

J-L Battaglia, Andrzej Kusiak, Vincent Schick, Andrea Cappella, Claudia Wiemer, Massimo Longo, Enrico Varesi

Thermal characterization of the Si O 2-Ge 2 Sb 2 Te 5 interface from room temperature up to 400° C

Journal of Applied Physics [American Institute of Physics], Volume: 107 Issue: 4 Pages: 044314

M Perego, G Seguini, C Wiemer, M Fanciulli, PE Coulon, C Bonafos

Si nanocrystal synthesis in HfO {sub 2}/SiO/HfO {sub 2} multilayer structures

Nanotechnology (Print) [], Volume: 21

M Perego, G Seguini, C Wiemer, M Fanciulli, PE Coulon, C Bonafos

Si nanocrystal synthesis in HfO2/SiO/HfO2 multilayer structures

Nanotechnology [IOP Publishing], Volume: 21 Issue: 5 Pages: 055606

L Lamagna, C Wiemer, S Baldovino, A Molle, M Perego, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, M Fanciulli

Thermally induced permittivity enhancement in La-doped ZrO 2 grown by atomic layer deposition on Ge (100)

Applied Physics Letters [American Institute of Physics], Volume: 95 Issue: 12 Pages: 122902

Xavier Garros, Mikaël Casse, M Rafik, Claire Fenouillet-Béranger, Gilles Reimbold, F Martin, C Wiemer, F Boulanger

Process dependence of BTI reliability in advanced HK MG stacks

Microelectronics Reliability [Pergamon], Volume: 49 Issue: 9-11 Pages: 982-988

R Mantovan, C Wiemer, A Lamperti, A Zenkevich, Yu Lebedinski, M Fanciulli

Dehydrogenation at the Fe/Lu 2 O 3 interface upon rapid thermal annealing

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 321 Issue: 15 Pages: 2350-2353

R Mantovan, C Wiemer, A Lamperti, A Zenkevich, Yu Lebedinski, M Fanciulli

Dehydrogenation at the Fe/Lu2O3 interface upon rapid thermal annealing

Journal of magnetism and magnetic materials [North-Holland], Volume: 321 Issue: 15 Pages: 2350-2353

Roberto Fallica, Jean-Luc Battaglia, Simone Cocco, Cristiano Monguzzi, Andrew Teren, Claudia Wiemer, Enrico Varesi, Raimondo Cecchini, Andrea Gotti, Marco Fanciulli

Thermal and electrical characterization of materials for phase-change memory cells

Journal of Chemical & Engineering Data [American Chemical Society], Volume: 54 Issue: 6 Pages: 1698-1701

C Gaumer, E Martinez, S Lhostis, C Wiemer, M Perego, V Loup, D Lafond, J-M Fabbri

Chemical and structural properties of a TaN/HfO2 gate stack processed using atomic vapor deposition

Journal of The Electrochemical Society [IOP Publishing], Volume: 156 Issue: 7 Pages: G78

XL Li, D Tsoutsou, G Scarel, C Wiemer, SC Capelli, SN Volkos, L Lamagna, M Fanciulli

Chemical and structural properties of atomic layer deposited La 2 O 3 films capped with a thin Al 2 O 3 layer

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [American Vacuum Society], Volume: 27 Issue: 2 Pages: L1-L7

O Salicio, C Wiemer, M Fanciulli, W Gawelda, Jan Siegel, Carmen N Afonso, V Plausinaitiene, A Abrutis

Effect of pulsed laser irradiation on the structure of GeTe films deposited by metal organic chemical vapor deposition: A Raman spectroscopy study

Journal of Applied Physics [American Institute of Physics], Volume: 105 Issue: 3 Pages: 033520

A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, W Gawelda, Jan Siegel, S Rushworth

Hot-wire chemical vapor growth and characterization of crystalline GeTe films

Journal of crystal growth [North-Holland], Volume: 311 Issue: 2 Pages: 362-367

S Schamm, PE Coulon, S Miao, S No Volkos, mL H Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3∕ Si Interfaces for Advanced Gate Stacks

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 156 Issue: 1 Pages: H1-H6

S Schamm, PE Coulon, S Miao, SN Volkos, LH Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Semiconductor Devices, Materials, and Processing-Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3/Si Interfaces for Advanced Gate Stacks

Journal of the Electrochemical Society [], Volume: 156 Issue: 1 Pages: H1

C GAUMER, E MARTINEZ, S LHOSTIS, C WIEMER, M PEREGO, V LOUP, D LAFOND, J-M FABBRI

Chemical and Structural Properties of a TaN

Journal of the Electrochemical Society [Electrochemical Society], Volume: 156 Issue: 7

A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, O Salicio, M Longo, A Pirovano, Jan Siegel, W Gawelda, S Rushworth, C Giesen

Chemical vapor deposition of chalcogenide materials for phase-change memories

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2338-2341

A Lamperti, S Spiga, HL Lu, C Wiemer, M Perego, E Cianci, M Alia, M Fanciulli

Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2425-2429

S Spiga, A Lamperti, C Wiemer, M Perego, E Cianci, G Tallarida, HL Lu, M Alia, FG Volpe, M Fanciulli

Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2414-2419

M Longo, O Salicio, C Wiemer, R Fallica, A Molle, M Fanciulli, C Giesen, B Seitzinger, PK Baumann, M Heuken, S Rushworth

Growth study of GexSbyTez deposited by MOCVD under nitrogen for non-volatile memory applications

Journal of Crystal Growth [North-Holland], Volume: 310 Issue: 23 Pages: 5053-5057

A Molle, S Spiga, Md NK Bhuiyan, G Tallarida, M Perego, C Wiemer, Marco Fanciulli

Atomic oxygen-assisted molecular beam deposition of Gd 2 O 3 films for ultra-scaled Ge-based electronic devices

Materials Science in Semiconductor Processing [Pergamon], Volume: 11 Issue: 5 Pages: 236-240

S Schamm, Pierre-Eugène Coulon, S Miao, S No Volkos, mL H Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Chemical/Structural nanocharacterization and electrical properties of ALD-Grown La2O3∕ Si interfaces for advanced gate stacks

Journal of The Electrochemical Society [IOP Publishing], Volume: 156 Issue: 1 Pages: H1

Sylvie Schamm, Pierre-Eugène Coulon, Shu Miao, Stelios N Volkos, L H Lu, Luca Lamagna, C Wiemer, Dimitra Tsoutsou, Giovanna Scarel, Marco Fanciulli

ALD-Grown Rare Earth Oxides for Advanced Gate Stacks

ECS Transactions [IOP Publishing], Volume: 13 Issue: 1 Pages: 77

Clement Gaumer, Eugenie Martinez, Sandrine Lhostis, Claudia Wiemer, Michele Perego, Virginie Loup, Dominique Lafond, Jean-Marc Fabbri

Interface Study in a" Metal/High-k" Gate Stack: Tantalum Nitride on Hafnium Oxide

ECS Transactions [IOP Publishing], Volume: 16 Issue: 5 Pages: 99

A Debernardi, C Wiemer, M Fanciulli

Epitaxial anatase HfO 2 on high-mobility substrate for ultra-scaled CMOS devices

Materials science in semiconductor processing [Pergamon], Volume: 11 Issue: 5-6 Pages: 241-244

A Molle, S Spiga, Md NK Bhuiyan, G Tallarida, M Perego, C Wiemer, Marco Fanciulli

Atomic oxygen-assisted molecular beam deposition of Gd2O3 films for ultra-scaled Ge-based electronic devices

Materials science in semiconductor processing [Pergamon], Volume: 11 Issue: 5-6 Pages: 236-240

Richard J Matyi, Laura E Depero, Elza Bontempi, Paolo Colombi, Alan Gibaud, Matej Jergel, Michael Krumrey, TA Lafford, Alessio Lamperti, M Meduna, A Van der Lee, Claudia Wiemer

The international VAMAS project on X-ray reflectivity measurements for evaluation of thin films and multilayers—Preliminary results from the second round-robin

Thin Solid Films [Elsevier], Volume: 516 Issue: 22 Pages: 7962-7966

HL Lu, G Scarel, C Wiemer, M Perego, S Spiga, M Fanciulli, G Pavia

Atomic layer deposition of NiO films on Si (100) using cyclopentadienyl-type compounds and ozone as precursors

Journal of The Electrochemical Society [IOP Publishing], Volume: 155 Issue: 10 Pages: H807

Adulfas Abrutis, Valentina Plausinaitiene, Martynas Skapas, Claudia Wiemer, Olivier Salicio, Agostino Pirovano, Enrico Varesi, Simon Rushworth, Wojciech Gawelda, Jan Siegel

Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications

Chemistry of Materials [American Chemical Society], Volume: 20 Issue: 11 Pages: 3557-3559

Alessandro Molle, Claudia Wiemer, MDNK Bhuiyan, Grazia Tallarida, Marco Fanciulli

Epitaxial growth of cubic Gd2O3 thin films on Ge substrates

Journal of Physics: Conference Series [IOP Publishing], Volume: 100 Issue: 4 Pages: 042048

Paolo Colombi, DK Agnihotri, VE Asadchikov, Elza Bontempi, D Keith Bowen, C-H Chang, Laura E Depero, Mark Farnworth, Toshiyuki Fujimoto, Alan Gibaud, Matej Jergel, Michael Krumrey, TA Lafford, A Lamperti, T Ma, RJ Matyi, M Meduna, Silvia Milita, Kenji Sakurai, Leonid Shabel'nikov, Alexander Ulyanenkov, A Van der Lee, Claudia Wiemer

Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment

Journal of Applied Crystallography [International Union of Crystallography], Volume: 41 Issue: 1 Pages: 143-152

Jan Siegel, W Gawelda, D Puerto, Carlos Dorronsoro, J Solis, Carmen N Afonso, JCG De Sande, R Bez, A Pirovano, C Wiemer

Amorphization dynamics of Ge 2 Sb 2 Te 5 films upon nano-and femtosecond laser pulse irradiation

Journal of Applied Physics [American Institute of Physics], Volume: 103 Issue: 2 Pages: 023516

DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, CH Chang, P Colombi, LE Depero, M Farnworth, T Fujimoto, A Gibaud, M Jergel, M Krumrey, TA Lafford, A Lamperti, T Ma, RJ Matyi, M Meduna, S Milita, G Oliviero, K Sakurai, L Shabel'Nikov, A Ulyanenkov, A van der Lee, C Wiemer

Reproducability in X-Ray reflectometry: results from the first reflectivity round robin

Journal of Applied Crystallography [], Volume: 41 Pages: 143-15

HL LU, G SCAREL, C WIEMER, M PEREGO, S SPIGA, M FANCIULLI, G PAVIA

Atomic Layer Deposition of NiO Films on Si

Journal of the Electrochemical Society [Electrochemical Society], Volume: 155 Issue: 10

Alberto Debernardi, Claudia Wiemer, Marco Fanciulli

Epitaxial phase of hafnium dioxide for ultrascaled electronics

Physical Review B [American Physical Society], Volume: 76 Issue: 15 Pages: 155405

Annalisa Del Vitto, Rossella Piagge, Massimo Caniatti, Claudia Wiemer, Giuseppe Pavia, Francesca Sammiceli, Enrica Ravizza, Salvatore Grasso, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Gabriella Ghidini, Christophe Pomarede, Jan Willem Maes, Mauro Alessandri

A Morphological, Chemical and Electrical Study of HfSiON Films for Inter Poly Dielectric Applications in Flash Memories

ECS Transactions [IOP Publishing], Volume: 11 Issue: 4 Pages: 497

Annalisa Del Vitto, Rossella Piagge, Massimo Caniatti, Claudia Wiemer, Giuseppe Pavia, Francesca Sammiceli, Enrica Ravizza, Salvatore Grasso, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Gabriella Ghidini, Christophe Pomarede, Jan Willem Maes, Mauro Alessandri

A Morphological, Chemical and Electrical Study of HfSiON Films Properties for Interpoly Dielectric Applications in Flash Memories

ECS Meeting Abstracts [IOP Publishing], Issue: 20 Pages: 1160

G Scarel, C Wiemer, M Fanciulli, IL Fedushkin, GK Fukin, GA Domrachev, Y Lebedinskii, A Zenkevich, G Pavia

[(Me3Si) 2N] 3Lu: Molecular Structure and Use as Lu and Si Source for Atomic Layer Deposition of Lu Silicate Films

Zeitschrift für anorganische und allgemeine Chemie [WILEY‐VCH Verlag], Volume: 633 Issue: 11‐12 Pages: 2097-2103

V Cosnier, P Besson, V Loup, L Vandroux, S Minoret, M Cassé, X Garros, JM Pedini, S Lhostis, K Dabertrand, C Morin, C Wiemer, M Perego, M Fanciulli

Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques

Microelectronic engineering [Elsevier], Volume: 84 Issue: 9-10 Pages: 1886-1889

A Zenkevich, Yu Lebedinskii, S Spiga, C Wiemer, G Scarel, M Fanciulli

Effects of thermal treatments on chemical composition and electrical properties of ultra-thin Lu oxide layers on Si

Microelectronic engineering [Elsevier], Volume: 84 Issue: 9-10 Pages: 2263-2266

Alessandro Molle, Michele Perego, Md Nurul Kabir Bhuiyan, Claudia Wiemer, Grazia Tallarida, Marco Fanciulli

The interface between Gd 2 O 3 films and Ge (001): A comparative study between molecular and atomic oxygen mediated growths

Journal of Applied Physics [American Institute of Physics], Volume: 102 Issue: 3 Pages: 034513

J-L Battaglia, C Wiemer, M Fanciulli

An accurate low-frequency model for the 3 ω method

Journal of Applied Physics [American Institute of Physics], Volume: 101 Issue: 10 Pages: 104510

Alessandro Molle, Claudia Wiemer, Md Nurul Kabir Bhuiyan, Grazia Tallarida, Marco Fanciulli, Giuseppe Pavia

Cubic-to-monoclinic phase transition during the epitaxial growth of crystalline Gd 2 O 3 films on Ge (001) substrates

Applied physics letters [American Institute of Physics], Volume: 90 Issue: 19 Pages: 193511

Alessandro MOLLE, Michele PEREGO, Md NURUL, Kabir BHUIYAN, Claudia WIEMER, Grazia TALLARIDA, Marco FANCIULLI

The interface between Gd2O3 films and Ge

Journal of applied physics [American Institute of Physics], Volume: 102 Issue: 3

Claudia Dallera, Francesca Fracassi, Lucio Braicovich, Giovanna Scarel, Claudia Wiemer, Marco Fanciulli, Giuseppe Pavia, Bruce CC Cowie

Nondestructive diagnostics of high-κ dielectrics for advanced electronic devices

Applied physics letters [American Institute of Physics], Volume: 89 Issue: 18 Pages: 183521

Mauro Alessandri, Rossella Piagge, Massimo Caniatti, Annalisa Del Vitto, Claudia Wiemer, Giuseppe Pavia, Stefano Alberici, Enrico Bellandi, Angeloclaudio Nale

Structural and Chemical Investigation of Annealed Al2O3 Films for Interpoly Dielectric Application in Flash Memories

ECS Transactions [IOP Publishing], Volume: 3 Issue: 3 Pages: 183

G Scarel, C Wiemer, G Tallarida, S Spiga, G Seguini, E Bonera, M Fanciulli, Y Lebedinskii, A Zenkevich, G Pavia, IL Fedushkin, GK Fukin, GA Domrachev

Atomic layer deposition of Lu silicate films using [(Me3Si) 2N] 3Lu

Journal of The Electrochemical Society [IOP Publishing], Volume: 153 Issue: 11 Pages: F271

S Ferrari, S Spiga, C Wiemer, M Fanciulli, A Dimoulas

Germanium diffusion during Hf O 2 growth on Ge by molecular beam epitaxy

Applied physics letters [American Institute of Physics], Volume: 89 Issue: 12 Pages: 122906

Christian Monzio Compagnoni, Alessandro S Spinelli, Andrea Bianchini, Andrea L Lacaita, Sabina Spiga, Giovanna Scarel, Claudia Wiemer, Marco Fanciulli

Temperature dependence of transient and steady-state gate currents in Hf O 2 capacitors

Applied physics letters [American Institute of Physics], Volume: 89 Issue: 10 Pages: 103504

SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia

Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism

Chemistry of materials [American Chemical Society], Volume: 18 Issue: 16 Pages: 3764-3773

Mauro Alessandri, Rossella Piagge, Stefano Alberici, Enrico Bellandi, Massimo Caniatti, Gabriella Ghidini, Alberto Modelli, Giuseppe Pavia, Enrica Ravizza, Alessandro Sebastiani, Claudia Wiemer, Sabina Spiga, Marco Fanciulli, Vincenzo Fiorentini, Emiliano Cadelano, Giorgia Maria Lopez

High-k materials in flash memories

ECS Transactions [IOP Publishing], Volume: 1 Issue: 5 Pages: 91

M Malvestuto, G Scarel, C Wiemer, M Fanciulli, F d’Acapito, F Boscherini

X-ray absorption spectroscopy study of Yb 2 O 3 and Lu 2 O 3 thin films deposited on Si (100) by atomic layer deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms [North-Holland], Volume: 246 Issue: 1 Pages: 90-95

M Malvestuto, G Scarel, C Wiemer, M Fanciulli, F d’Acapito, F Boscherini

X-ray absorption spectroscopy study of Yb2O3 and Lu2O3 thin films deposited on Si (1 0 0) by atomic layer deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms [North-Holland], Volume: 246 Issue: 1 Pages: 90-95

F d’Acapito, G Smolentsev, F Boscherini, M Piccin, G Bais, S Rubini, F Martelli, Alfonso Franciosi

Site of Mn in Mn δ-doped GaAs: X-ray absorption spectroscopy

Physical Review B [American Physical Society], Volume: 73 Issue: 3 Pages: 035314

Agostino Pirovano, Luca Perniola, Hiroshi Mizuta, Heike Riel, Damien Deleruyelle, Rainer Waser, Sidhu Maikap, Grazia Tallarida, Claudia Wiemer, Daniele Ielmini

Emerging non-volatile memories

IEDM Short Course [], Volume: 274 Issue: 5

Agostino Pirovano, Luca Perniola, Hiroshi Mizuta, Heike Riel, Damien Deleruyelle, Rainer Waser, Sidhu Maikap, Grazia Tallarida, Claudia Wiemer, Daniele Ielmini

Emerging non-volatile memories

IEDM Short Course [], Volume: 274 Issue: 5

G Brunoldi, S Guerrieri, SG Alberici, E Ravizza, G Tallarida, C Wiemer, T Marangon

Self-annealing and aging effect characterization on copper seed thin films

Microelectronic engineering [Elsevier], Volume: 82 Issue: 3-4 Pages: 289-295

S Spiga, C Wiemer, G Tallarida, G Scarel, S Ferrari, G Seguini, M Fanciulli

Effects of the oxygen precursor on the electrical and structural properties of Hf O 2 films grown by atomic layer deposition on Ge

Applied Physics Letters [American Institute of Physics], Volume: 87 Issue: 11 Pages: 112904

S Kremmer, H Wurmbauer, C Teichert, G Tallarida, S Spiga, C Wiemer, M Fanciulli

Nanoscale morphological and electrical homogeneity of HfO 2 and ZrO 2 thin films studied by conducting atomic-force microscopy

Journal of applied physics [American Institute of Physics], Volume: 97 Issue: 7 Pages: 074315