Semiconductor Devices, Materials, and Processing-Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3/Si Interfaces for Advanced Gate Stacks

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Type:

Journal

Description:

Publisher:

Publication date:

1 Jan 2009

Authors:

S Schamm, PE Coulon, S Miao, SN Volkos, LH Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Biblio References:

Volume: 156 Issue: 1 Pages: H1

Origin:

Journal of the Electrochemical Society

Link:

Scientific Productions