Growth and characterization of 2D materials (transition metal dichalcogenides, MoS2, MoTe2, WS2); High-k materials for high capacitors for BCD and Power discrete; Magnetic multilayers for spintronics (p-MTJ, i-MTJ, MRAM, STT-RAM, shift register); Dilute magnetic oxides (Fe-, Ni-doped ZrO2); X-ray scattering on thin films and multilayers (X-ray reflectivity, X-ray diffraction); X-ray resonant magnetic scattering; Secondary Ion Mass Spectrometry (ToF-SIMS, D-SIMS, S-SIMS); X-ray Photoelectron Spectroscopy; FTIR, UV-Vis-NIR and Raman Spectroscopies.
Alessio Lamperti is currently Research Scientist (Technologist) at CNR-IMM Unit of Agrate Brianza (Italy). He got the M. Eng. in Nuclear Engineering and the Ph.D. cum laude in Radiation Science and Technology both at Politecnico di Milano, the latter in a joint research project with The University of Chicago (USA) financed with a fellowship from Assolombarda (the association of industry in region Lombardy). Further, he was a Post Doc Marie Curie Fellow at the Physics Dept., University of Durham (Durham, UK) within EU-RTN Ultrasmooth.
He is recognized, advanced expert in the physical and chemical characterization of materials at the nanoscale down to two-dimensional (2D) layers, with focus on the study of correlations between structure and magnetism in ferromagnetic thin layers, spin valves and in oxide/CoFeB coupled structures, such as MgO/CoFeB/Ta magnetic tunnel junctions. He is also advanced expert in the characterization of oxides grown by Atomic Layer Deposition (ALD) such as pure and Al doped HfO2 or ZrO2, NiO, diluted magnetic oxides (Fe:ZrO2), rare earth oxides (La2O3, Gd2O3).
Since Ph.D., he is experienced in Secondary Ion Mass Spectrometry (SIMS), both on the use of SIMS as analytical technique with nanometric lateral resolution, for surface chemical imaging and, over the years, in dual beam time of flight (ToF) SIMS configuration to obtain chemical depth profiles of complex multilayered stacks integrating nanometer thick layers of high-k dielectrics, ferromagnets, metals, targeting non-volatile memories concepts, with particular emphasis on the evolution of chemical elements interdiffusion phenomena at the interfaces. In this context, he recently succeeded in obtain unique details on the relation between ion irradiation and evolution of the element chemical profiles in ultra-thin Ta/MgO/CoFeB/Ta stacks explaining the observed changes in the magnetic behavior.
He is also expert in X-ray Photoelectron Spectroscopy (XPS), also angle resolved, to retrieve the chemistry at surface and sub-surface interfaces, with focus on oxidation states in Oxide/Metal (including ferromagnets) ultra-thin layers.
Further, he is expert in x-ray scattering techniques (XRR, GI-XRD) using lab equipment and synchrotron light or neutron methods (PNR), to gain knowledge of the correlation between structure, magnetism and electrical properties in nanoscale thin films and multilayers for spintronics and emerging nanoelectronics. In this context he characterized MIM structures for RRAM and TANOS, magnetic storage concepts implementing p-MTJ for STT-MRAM or shift register devices, also CoFeB based, and explorative solutions implementing magnetically doped high-k materials for foreseen MTJs or spin injectors.
Recently, he enlarged his interests on the study of 2D transition metal di-chalcogenides (MoS2, MoTe2, WS2) grown by chemical vapor deposition in respect to structure, chemical, electrical, magnetic and topological properties. Currently, he coordinates the research team developing 2D transition metal dichalcogenides.
He is also experienced in Raman, FT-IR and nIR-VIS-UV optical spectroscopies.
Above mentioned activities were/are taken as key person in the framework of several EU (FP6, FP7, Horizon2020), national (MIUR FIRB and PRIN) and industrial R&D projects; specifically, he was/is Unit responsible for EU-ECSEL R2Power300 “Preparing R2 extension to 300mm for BCD Smart Power”, PRIN HotPlasMoS2 “Hot-electrons in self-organised plasmonic metasurfaces coupled to semiconducting MoS2 nanosheets: photon harvesting in 2D materials” and PRIN aSTAR “Attosecond transient absorption and reflectivity for the study of exotic materials” projects. He collaborates and interacts with semiconductor companies (Micron, STMicroelectronics).
He is is co-author of more than 130 publications on peer reviewed journals and proceedings.