X‐ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano‐layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer. Copyright © 2012 John Wiley & Sons, Ltd.
John Wiley & Sons, Ltd
1 Aug 2012
Volume: 44 Issue: 8 Pages: 1209-1213
Surface and interface analysis