Type:
Book
Description:
The critical role of gate oxide in ultra-scaled devices is being investigated in terms of the properties of rare earth oxides as high dielectric constant (high-κ) materials to replace SiO2. In particular, the combination of rare earth oxides with high-mobility substrates, like Ge and GaAs, could offer the possibility to improve the interface properties. Among the different properties under investigation, the band alignment at the interface is a key issue because it affects the tunneling behavior of a device. Internal photoemission and X-ray photoelectron spectroscopy are useful techniques to experimentally determine the band offset at the semiconductor/oxide interface. After a detailed description of these two methods, we present a review of the data available in the literature on the interface of different high-κ oxides on silicon. Finally, we report our measurements of the Lu2O3 band alignment on …
Publisher:
Springer, Berlin, Heidelberg
Publication date:
1 Jan 2007
Biblio References:
Pages: 269-283
Origin:
Rare Earth Oxide Thin Films