The present paper focuses on the influence of different solvents (toluene, mesitylene, acetone, tetrahydrofuran, propylene glycol monomethyl ether acetate (PGMEA) and ethyl acetate) on the self‐assembly behaviour of cylinder‐forming polystyrene‐block‐poly(dimethylsiloxane‐random‐vinylmethylsiloxane) diblock copolymer films deposited on thin brush layers of polystyrene (PS) or polymethylmethacrylate (PMMA) polymers grafted to a silicon substrate. The morphology and the key metrics for all samples were determined from the analysis of the SEM images and their evolution was investigated, as a function of the annealing time at 310 °C, for each solvent and for both PS and PMMA brushes. In general, shorter correlation lengths ξ are observed on PS brushes than on PMMA brushes. In addition, SEM data analysis reveals that tetrahydrofuran, PGMEA and ethyl acetate solvents promote a morphological …