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Improved resistive switching phenomena and mechanism using Cu-Al alloy in a new Cu: AlOx/TaOx/TiN structure

Type: 
Journal
Description: 
Publisher: 
Elsevier
Publication date: 
15 Jul 2015
Authors: 

S Roy, S Maikap, G Sreekanth, M Dutta, D Jana, YY Chen, JR Yang

Biblio References: 
Volume: 637 Pages: 517-523
Origin: 
Journal of Alloys and Compounds
Link: 
https://scholar.google.it/citations?view_op=view_citation&hl=en&citation_for_vie…

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