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The pattern coarsening dynamics in symmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymer thin films under conventional thermal treatments is extremely slow, resulting in limited correlation length values even after prolonged annealing at relatively high temperatures. This study describes the kinetics of symmetric block copolymer microphase separation when subjected to a thermal treatment based on the use of a Rapid Thermal Processing (RTP) system. The proposed methodology allows self-organization of symmetric PS-b-PMMA thin films in few seconds, taking advantage of the amount of solvent naturally trapped within the film during the spinning process. Distinct and self-registered morphologies, coexisting along the sample thickness, are obtained in symmetric PS-b-PMMA samples, with periodic lamellae laying over a hexagonal pattern of PMMA cylinders embedded in the PS matrix …
Royal Society of Chemistry
Publication date: 
1 Jan 2014

Michele Perego, Federico Ferrarese Lupi, Monica Ceresoli, Tommaso Jacopo Giammaria, Gabriele Seguini, Emanuele Enrico, Luca Boarino, Diego Antonioli, Valentina Gianotti, Katia Sparnacci, Michele Laus

Biblio References: 
Volume: 2 Issue: 32 Pages: 6655-6664
Journal of Materials Chemistry C