Summary form only given. Synthesis of nanopatterned magnetic materials offers advanced capabilities in tailoring material structures and opens up new opportunities for engineering innovative devices (i .e . electronic and biomedical) . In the frame of magnetic materials, the most demanding application consists in fabricating high-density arrays for use in data storage and magnetic sensors for spintronics [1] . In the last decade, many routes for the reliable fabrication of magnetic nanostructures have been extensively investigated, including top-down lithography and bottom-up self-assembly processes . Conventional electron beam lithography (EBL) soon turned out to be limited by low-speed and high costs while self-assembling emerged as a viable and handy alternative technique for designing nanostructures over a wide area on magnetic thin films . In the last decade, nanolithography routes based on self …