-A A +A
The block copolymer self‐assembly provides a reliable tool for the planar organization of materials at the nanoscale. In this paper, we review our recent achievements in the case of the polystyrene‐b‐poly(methyl‐methacrylate) (PS‐b‐PMMA) polymeric mixture. By the proper choice of deposition and treatment parameters, one can adjust the thickness of the deposited material and transfer the block copolymer cylindrical organization to the material inclusions into the matrix. Silicon nanocrystals (Si‐ncs) have been used as the active material to process, due to its interesting electrical and optical properties for electronic and photonic applications. This material has been fabricated in the form of well‐defined arrays over a macroscopic surface, either by electron beam deposition or by ion beam synthesis. A further, crucial step toward the fabrication of the active area of the device is the formation of Si nanoparticle arrays …
Publication date: 
1 Aug 2013

Paolo Pellegrino, Michele Perego, Sylvie Schamm‐Chardon, Gabriele Seguini, Andrea Andreozzi, Federico Ferrarese Lupi, Celia Castro, Gerard Ben Assayag

Biblio References: 
Volume: 210 Issue: 8 Pages: 1477-1484
physica status solidi (a)